화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Improvement in gate LWR with plasma curing of ArF photoresists
Ando A, Matsui E, Matsuzawa NN, Yamaguchi Y, Kugimiya K, Yoshida M, Salam KMA, Kusakabe T, Tatsumi T
Thin Solid Films, 515(12), 4928, 2007
2 Structural and electrical properties of crystalline (1-x)Ta2O5-xTiO(2) thin films fabricated by metalorganic decomposition
Salam KMA, Konishi H, Mizuno M, Fukuda H, Nomura S
Applied Surface Science, 190(1-4), 88, 2002