| 1 |
Regulation of the Dot1 histone H3K79 methyltransferase by histone H4K16 acetylation
Valencia-Sanchez MI, De Ioannes P, Wang M, Truong DM, Lee R, Armache JP, Boeke JD, Armache KJ
Science, 371(6527), 363, 2021 |
| 2 |
Electrochemical performance of activated screen printed carbon electrodes for hydrogen peroxide and phenol derivatives sensing
Gonzalez-Sanchez MI, Gomez-Monedero B, Agrisuelas J, Iniesta J, Valero E
Journal of Electroanalytical Chemistry, 839, 75, 2019 |
| 3 |
Photochemical, thermal, biological and long-term degradation of celecoxib in river water. Degradation products and adsorption to sediment
Jimenez JJ, Pardo R, Sanchez MI, Munoz BE
Journal of Hazardous Materials, 342, 252, 2018 |
| 4 |
Electrochemical Properties of Poly(Azure A) Films Synthesized in Sodium Dodecyl Sulfate Solution
Agrisuelas J, Gonzalez-Sanchez MI, Valero E
Journal of the Electrochemical Society, 164(2), G1, 2017 |
| 5 |
Biocatalytic oxidation of phenolic compounds by bovine methemoglobin in the presence of H2O2: Quantitative structure-activity relationships
Perez-Prior MT, Gomez-Bombarelli R, Gonzalez-Sanchez MI, Valero E
Journal of Hazardous Materials, 241, 207, 2012 |
| 6 |
Fluorescence Decrease of Conjugated Polymers by the Catalytic Activity of Horseradish Peroxidase and Its Application in Phenolic Compounds Detection
Gonzalez-Sanchez MI, Laurenti M, Rubio-Retama J, Valero E, Lopez-Cabarcos E
Biomacromolecules, 12(4), 1332, 2011 |
| 7 |
Acid-base reactions in a positive tone chemically amplified photoresist and their effect on imaging
Houle FA, Hinsberg WD, Sanchez MI
Journal of Vacuum Science & Technology B, 22(2), 747, 2004 |
| 8 |
Product volatilization as a probe of the physics and chemistry of latent image formation in chemically amplified resists
Hinsberg WD, Houle FA, Poliskie GM, Pearson D, Sanchez MI, Ito H
Journal of Physical Chemistry A, 106(42), 9776, 2002 |
| 9 |
Influence of resist components on image blur in a patterned positive-tone chemically amplified photoresist
Houle FA, Hinsberg WD, Sanchez MI, Hoffnagle JA
Journal of Vacuum Science & Technology B, 20(3), 924, 2002 |
| 10 |
Kinetic model for positive tone resist dissolution and roughening
Houle FA, Hinsberg WD, Sanchez MI
Macromolecules, 35(22), 8591, 2002 |
