화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Chemistry in long residence time fluorocarbon plasmas
Sant SP, Nelson CT, Overzet LJ, Goeckner MJ
Journal of Vacuum Science & Technology A, 27(2), 193, 2009
2 Relationship between gas-phase chemistries and surface processes in fluorocarbon etch plasmas: A process rate model
Sant SP, Nelson CT, Overzet LJ, Goeckner MJ
Journal of Vacuum Science & Technology A, 27(4), 631, 2009
3 Role of chamber dimension in fluorocarbon based deposition and etching of SiO2 and its effects on gas and surface-phase chemistry
Joseph EA, Zhou BS, Sant SP, Overzet LJ, Goeckner MJ
Journal of Vacuum Science & Technology A, 26(3), 545, 2008
4 Effects of pore morphology on the diffusive properties of a porous low-kappa dielectric
Joseph EA, Sant SP, Goeckner MJ, Overzet LJ, Peng HG, Gidley DW, Kastenmeier BEE
Journal of Vacuum Science & Technology B, 25(5), 1684, 2007
5 Effect of surface temperature on plasma-surface interactions in an inductively coupled modified gaseous electronics conference reactor
Zhou BS, Joseph EA, Sant SP, Liu YH, Radhakrishnan A, Overzet LJ, Goeckner MJ
Journal of Vacuum Science & Technology A, 23(6), 1657, 2005
6 Investigation and modeling of plasma-wall interactions in inductively coupled fluorocarbon plasmas
Joseph EA, Zhou B, Sant SP, Overzet LJ, Goeckner MJ
Journal of Vacuum Science & Technology A, 22(3), 689, 2004