화학공학소재연구정보센터
검색결과 : 10건
No. Article
1 Massive Theoretical Screen of Hole Conducting Organic Materials in the Heteroacene Family by Using a Cloud-Computing Environment
Matsuzawa NN, Arai H, Sasago M, Fujii E, Goldberg A, Mustard TJ, Kwak HS, Giesen DJ, Ranalli F, Halls MD
Journal of Physical Chemistry A, 124(10), 1981, 2020
2 Machine-Learning Guided Quantum Chemical and Molecular Dynamics Calculations to Design Novel Hole-Conducting Organic Materials
Antono E, Matsuzawa NN, Ling JL, Saal JE, Arai H, Sasago M, Fujii E
Journal of Physical Chemistry A, 124(40), 8330, 2020
3 Synthesis of poly[N-(1-adamantyl)vinylsulfonamide-co-2-(2-methyl)adamantyl methacrylatel for 193 nm lithography
Fukuhara T, Shibasaki Y, Ando S, Kishimura S, Endo M, Sasago M, Ueda M
Macromolecules, 38(8), 3041, 2005
4 Study on beam size correction free from Coulomb interaction
Takenaka H, Sasago M
Journal of Vacuum Science & Technology B, 20(1), 138, 2002
5 Study of the resist deformation in nanoimprint lithography
Hirai Y, Fujiwara M, Okuno T, Tanaka Y, Endo M, Irie S, Nakagawa K, Sasago M
Journal of Vacuum Science & Technology B, 19(6), 2811, 2001
6 Reduction of line edge roughness in the top surface imaging process
Mori S, Morisawa T, Matsuzawa N, Kaimoto Y, Endo M, Matsuo T, Kuhara K, Sasago M
Journal of Vacuum Science & Technology B, 16(6), 3739, 1998
7 Pattern collapse in the top surface imaging process after dry development
Mori S, Morisawa T, Matsuzawa N, Kaimoto Y, Endo M, Matsuo T, Kuhara K, Sasago M
Journal of Vacuum Science & Technology B, 16(6), 3744, 1998
8 Prospect and Challenges of ArF Excimer-Laser Lithography Processes and Materials
Ohfuji T, Ogawa T, Kuhara K, Sasago M
Journal of Vacuum Science & Technology B, 14(6), 4203, 1996
9 New Chemically Amplified Positive Resist for Electron-Beam Lithography
Hashimoto K, Katsuyama A, Endo M, Sasago M
Journal of Vacuum Science & Technology B, 12(1), 37, 1994
10 Performance of 0.2 Mu-M Optical Lithography Using KrF and ArF Excimer-Laser Sources
Yamashita K, Endo M, Sasago M, Nomura N, Nagano H, Mizuguchi S, Ono T, Sato T
Journal of Vacuum Science & Technology B, 11(6), 2692, 1993