화학공학소재연구정보센터
검색결과 : 9건
No. Article
1 Effects of Electroplating at Lower Leveler and Suppressor Contents on the Formation of Very Low Resistivity Narrow Cu Interconnects
Miyamoto R, Tamahashi K, Inami T, Sasajima Y, Onuki J
Journal of the Electrochemical Society, 166(4), D137, 2019
2 Screening of Undesirable Elements Raising the Electrical Resistivity in Very Narrow Cu Wires by Ab Initio Calculation
Nagano T, Tamahashi K, Inami T, Sasajima Y, Onuki J
Journal of the Electrochemical Society, 164(9), D558, 2017
3 Resistivity Reduction in Very Narrow Cu Wiring
Onuki J, Sasajima Y, Tamahashi K, Ke YQ, Terada S, Hidaka K, Itoh S
Journal of the Electrochemical Society, 160(12), D3266, 2013
4 Substrate temperature dependence of electrical and structural properties of Ru films
Nagano T, Inokuchi K, Tamahashi K, Ishikawa N, Sasajima Y, Onuki J
Thin Solid Films, 520(1), 374, 2011
5 Grain coarsening mechanism of Cu thin films by rapid annealing
Sasajima Y, Kageyama J, Khoo K, Onuki J
Thin Solid Films, 518(23), 6883, 2010
6 Detection of protein tyrosine phosphorylation by open sandwich fluoroimmunoassay
Sasajima Y, Aburatani T, Sakamoto K, Ueda H
Biotechnology Progress, 22(4), 968, 2006
7 A novel EID family member, EID-3, inhibits differentiation and forms a homodimer or heterodimer with EID-2
Sasajima Y, Tanaka H, Miyake S, Yuasa Y
Biochemical and Biophysical Research Communications, 333(3), 969, 2005
8 Molecular dynamics study of cluster deposition in thermal plasma flash evaporation
Yamaguchi N, Sasajima Y, Terashima K, Yoshida T
Thin Solid Films, 345(1), 34, 1999
9 Monte-Carlo Simulations of Film Growth
Ozawa S, Sasajima Y, Heermann DW
Thin Solid Films, 272(2), 172, 1996