검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Vacuum ultraviolet spectra of fluorocompounds for 157 nm lithography Toriumi M, Satou I, Itani T Journal of Vacuum Science & Technology B, 18(6), 3328, 2000 |
| 2 |
Study of bilayer silylation process for 193 nm lithography using chemically amplified resist Satou I, Kuhara K, Endo M, Morimoto H Journal of Vacuum Science & Technology B, 17(6), 3326, 1999 |