화학공학소재연구정보센터
검색결과 : 12건
No. Article
1 Effective properties of a thermoelectric composite containing an elliptic inhomogeneity
Song K, Song HP, Li M, Schiavone P, Gao CF
International Journal of Heat and Mass Transfer, 135, 1319, 2019
2 A model for carbon nanotube-DNA hybrid using one-dimensional density of states
Malysheva O, Tang T, Schiavone P
Journal of Colloid and Interface Science, 380, 25, 2012
3 Binding Force Between a Charged Wall and a Complex Formed by a Polyelectrolyte and an Electronically Responsive Cylinder
Malysheva O, Tang TA, Schiavone P
Journal of Adhesion, 87(3), 251, 2011
4 Application of scatterometric porosimetry to characterize porous ultra low-k patterned layers
Licitra C, Bouyssou R, El Kodadi M, Haberfehlner G, Chevolleau T, Hazart J, Virot L, Besacier M, Schiavone P, Bertin F
Thin Solid Films, 519(9), 2825, 2011
5 Scatterometric porosimetry: A new characterization technique for porous material patterned structures
Bouyssou R, El Kodadi M, Licitra C, Chevolleau T, Besacier M, Posseme N, Joubert O, Schiavone P
Journal of Vacuum Science & Technology B, 28(4), L31, 2010
6 Real time scatterometry for profile control during resist trimming process
El Kodadi M, Soulan S, Besacier M, Schiavone P
Journal of Vacuum Science & Technology B, 27(6), 3232, 2009
7 Adhesion between a charged particle in an electrolyte solution and a charged substrate: Electrostatic and van der Waals interactions
Malysheva O, Tang T, Schiavone P
Journal of Colloid and Interface Science, 327(1), 251, 2008
8 Hyper high numerical aperature achromatic interferometer for immersion lithography at 193 nm
Charley AL, Lagrange A, Lartigue O, Simon J, Thony P, Schiavone P
Journal of Vacuum Science & Technology B, 23(6), 2668, 2005
9 Printability of nonsmoothed buried defects in extreme ultraviolet lithography mask blanks
Farys V, Charpin-Nicolle C, Richard M, Robic JY, Muffato V, Quesnel E, Postnikov S, Schiavone P, Besacier M, Smaali R, Naulleau P
Journal of Vacuum Science & Technology B, 23(6), 2860, 2005
10 Measurement of residual thickness using scatterometry
Fuard D, Perret C, Farys V, Gourgon C, Schiavone P
Journal of Vacuum Science & Technology B, 23(6), 3069, 2005