화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Development of ALD HfZrOx with TDEAH/TDEAZ and H2O
Shi X, Tielens H, Takeoka S, Nakabayashi T, Nyns L, Adelmann C, Delabie A, Schram T, Ragnarsson L, Schaekers M, Date L, Schreutelkamp R, Van Elshocht S
Journal of the Electrochemical Society, 158(1), H69, 2011
2 Ultrashallow junctions formed by C coimplantation with spike plus submelt laser annealing
Felch SB, Collart E, Parihar V, Thirupapuliyur S, Schreutelkamp R, Pawlak BJ, Hoffmann T, Severi S, Eyben P, Vandervorst W, Noda T
Journal of Vacuum Science & Technology B, 26(1), 281, 2008
3 Leakage current control in recessed SiGe Source/Drain junctions
Claeys C, Gonzalez MB, Eneman G, Verheyen P, Bender H, Schreutelkamp R, Washington L, Nouri F, Simoen E
Journal of the Electrochemical Society, 154(9), H814, 2007