화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Three-dimensional wafer-scale copper chemical-mechanical planarization model
Thakurta DG, Schwendeman DW, Gutmann RJ, Shankar S, Jiang L, Gill WN
Thin Solid Films, 414(1), 78, 2002
2 Three-dimensional chemical mechanical planarization slurry flow model based on lubrication theory
Thakurta DG, Borst CL, Schwendeman DW, Gutmann RJ, Gill WN
Journal of the Electrochemical Society, 148(4), G207, 2001
3 Pad porosity, compressibility and slurry delivery effects in chemical-mechanical planarization: modeling and experiments
Thakurta DG, Borst CL, Schwendeman DW, Gutmann RJ, Gill WN
Thin Solid Films, 366(1-2), 181, 2000
4 Two-dimensional wafer-scale chemical mechanical planarization models based on lubrication theory and mass transport
Sundararajan S, Thakurta DG, Schwendeman DW, Murarka SP, Gill WN
Journal of the Electrochemical Society, 146(2), 761, 1999