화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Characterization of a Low-Temperature, Low-Pressure Plasma-Enhanced Chemical-Vapor-Deposition Tetraethylorthosilicate Oxide Deposition Process
Arias LJ, Selbrede SC, Weise MT, Carl DA
Journal of Vacuum Science & Technology A, 15(3), 1389, 1997
2 Characterization of Fluorinated Tetra Ethyl Ortho Silicate Oxide-Films Deposited in a Low-Pressure Plasma-Enhanced Chemical-Vapor-Deposition Reactor
Weise MT, Selbrede SC, Arias LJ, Carl D
Journal of Vacuum Science & Technology A, 15(3), 1399, 1997