검색결과 : 3건
No. | Article |
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1 |
Tetrakis(trimethylsilyl)silane: Temperature dependence of vapor pressure, kinetics, and silicon carbide thin films by plasma-assisted liquid injection chemical vapor deposition process Selvakumar J, Sathiyamoorthy D, Nagaraja KS Materials Chemistry and Physics, 129(1-2), 62, 2011 |
2 |
Vapor pressure, kinetics and enthalpy of sublimation of bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II) Johnson MG, Selvakumar J, Nagaraja KS Thermochimica Acta, 495(1-2), 38, 2009 |
3 |
Temperature dependence vapour pressure measurements of Mg(tmhd)(2)(tmeda) [(tmhd=2,2,6,6-tetramethyl-3,5-heptanedione, tmeda = N,N,N',N'-tetramethylethylenediamine] Maria M, Selvakumar J, Raghunathan VS, Mathews T, Nagaraja KS Thermochimica Acta, 474(1-2), 87, 2008 |