화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Tetrakis(trimethylsilyl)silane: Temperature dependence of vapor pressure, kinetics, and silicon carbide thin films by plasma-assisted liquid injection chemical vapor deposition process
Selvakumar J, Sathiyamoorthy D, Nagaraja KS
Materials Chemistry and Physics, 129(1-2), 62, 2011
2 Vapor pressure, kinetics and enthalpy of sublimation of bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II)
Johnson MG, Selvakumar J, Nagaraja KS
Thermochimica Acta, 495(1-2), 38, 2009
3 Temperature dependence vapour pressure measurements of Mg(tmhd)(2)(tmeda) [(tmhd=2,2,6,6-tetramethyl-3,5-heptanedione, tmeda = N,N,N',N'-tetramethylethylenediamine]
Maria M, Selvakumar J, Raghunathan VS, Mathews T, Nagaraja KS
Thermochimica Acta, 474(1-2), 87, 2008