검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Comparison of flow models for photoresist Behavior at contact holes in thermal flow processes Eto H, Miyazaki M, Kondoh T, Shiobara E, Ito S, Homma T Journal of the Electrochemical Society, 154(10), H894, 2007 |
| 2 |
Highly cross-linked polysilane as antireflective coating for deep ultraviolet lithography to improve durability during SiO2 etching Sato Y, Shiobara E, Onishi Y, Yoshikawa S, Nakano Y, Hayase S, Hamada Y Journal of Vacuum Science & Technology B, 20(3), 909, 2002 |
| 3 |
Novel antireflective layer using polysilane for deep ultraviolet lithography Sato Y, Shiobara E, Miyoshi S, Asano M, Matsuyama H, Onishi Y, Nakano Y, Hayase S Journal of Vacuum Science & Technology B, 17(6), 3398, 1999 |
| 4 |
Resist design for resolution limit of KrF imaging towards 130 nm lithography Azuma T, Kawamura D, Matsunaga K, Shiobara E, Tanaka S, Onishi Y Journal of Vacuum Science & Technology B, 16(6), 3734, 1998 |