화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 The effects of vacuum-ultraviolet radiation on defects in low-k organosilicate glass (SiCOH) as measured with electron-spin resonance
Xue PP, Pei DF, Zheng HF, Li WY, Afanas'ev VV, Baklanov MR, de Marneffe JF, Lin YH, Fung HS, Chen CC, Nishi Y, Shohet JL
Thin Solid Films, 616, 23, 2016
2 Charging response of back-end-of-the-line barrier dielectrics to VUV radiation
Sinha H, Lauer JL, Antonelli GA, Nishi Y, Shohet JL
Thin Solid Films, 520(16), 5300, 2012
3 Changes to Charge and Defects in Dielectrics from Ion and Photon Fluences during Plasma Exposure
Ren H, Nishi Y, Shohet JL
Electrochemical and Solid State Letters, 14(3), H107, 2011
4 Effect of the dielectric-substrate interface on charge accumulation from vacuum ultraviolet irradiation of low-k porous organosilicate dielectrics
Sinha H, Sehgal A, Ren H, Nichols MT, Tomoyasu M, Russell NM, Nishi Y, Shohet JL
Thin Solid Films, 519(16), 5464, 2011
5 Charge Trapping within UV and Vacuum UV Irradiated Low-k Porous Organosilicate Dielectrics
Lauer JL, Sinha H, Nichols MT, Antonelli GA, Nishi Y, Shohet JL
Journal of the Electrochemical Society, 157(8), G177, 2010
6 Reflectance and substrate currents of dielectric layers under vacuum ultraviolet irradiation
Sinha H, Straight DB, Lauer JL, Fuller NC, Engelmann SU, Zhang Y, Antonelli GA, Severson M, Nishi Y, Shohet JL
Journal of Vacuum Science & Technology A, 28(6), 1316, 2010
7 Measuring vacuum ultraviolet radiation-induced damage
Lauer JL, Shohet JL, Hansen RW
Journal of Vacuum Science & Technology A, 21(4), 1253, 2003
8 X-Ray-Imaging During Plasma-Source Ion-Implantation
Piper M, Shohet JL, Booske JH, Chew KH, Zhang L, Sandstrom P, Jacobs J
Plasma Chemistry and Plasma Processing, 16(1), 141, 1996
9 Silicon-Oxide Deposition in an Electron-Cyclotron-Resonance Plasma with Microwave Spectroscopic Monitoring of SiO
Chew KH, Chen J, Woods RC, Shohet JL
Journal of Vacuum Science & Technology A, 13(5), 2483, 1995
10 Computer-Simulation of Mass-Selective Plasma-Source Ion-Implantation
Shohet JL, Wickesberg EB, Kushner MJ
Journal of Vacuum Science & Technology A, 12(4), 1380, 1994