화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 ICP etching of III-nitride based laser structure with Cl-2-Ar plasma assisted by Si coverplate material
Zhirnov E, Stepanov S, Gott A, Wang WN, Shreter YG, Tarkhin DV, Bochkareva NI
Journal of Vacuum Science & Technology A, 23(4), 687, 2005
2 Influence of cathode material and SiCl4 gas on inductively coupled plasma etching of AlGaN layers with Cl-2/Ar plasma
Zhirnov E, Stepanov S, Wang WN, Shreter YG, Takhin DV, Bochkareva NI
Journal of Vacuum Science & Technology A, 22(6), 2336, 2004
3 Misfit dislocations and radiative efficiency of InxGa1-xN/GaN quantum wells
Rebane YT, Shreter YG, Wang WN
Applied Surface Science, 166(1-4), 300, 2000