| 1 |
Surface morphology and growth mechanisms for sputtered amorphous silicon nitride thin films
Yu LH, Xu JH, Dong SR, Kojima I
Thin Solid Films, 516(8), 1781, 2008 |
| 2 |
Investigation of SiO2/Si3N4 films prepared on sapphire by rf magnetron reactive sputtering
Feng LP, Liu ZT, Li Q, Song WY
Applied Surface Science, 252(12), 4064, 2006 |
| 3 |
Deposition chemistry in the Cat-CVD processes of the SiH4/NH3 system
Umemoto H, Morimoto T, Yamawaki M, Masuda Y, Masuda A, Matsumura H
Thin Solid Films, 430(1-2), 24, 2003 |
| 4 |
Fabrication of silicon-on-insulator structure with Si3N4 as buried insulating films by epitaxial layer transfer
Xie XY, Zhang NL, Men C, Liu WL, Lin Q, An Z, Lin CL
Journal of Crystal Growth, 245(3-4), 207, 2002 |
| 5 |
Plasma nitridation of thin Si layers for GaAs dielectrics
Wang Z, Diatezua DM, Park DG, Chen Z, Morkoc H, Rockett A
Journal of Vacuum Science & Technology B, 17(5), 2034, 1999 |
| 6 |
Electrical-Properties of Metal-Insulator-Semiconductor Structures with Silicon-Nitride Dielectrics Deposited by Low-Temperature Plasma-Enhanced Chemical-Vapor-Deposition Distributed Electron-Cyclotron-Resonance
Hugon MC, Delmotte F, Agius B, Courant JL
Journal of Vacuum Science & Technology A, 15(6), 3143, 1997 |
