| 1 |
Synthesis and characterization of organosilicon compounds as novel precursors for CVD processes
Ermakova EN, Sysoev SV, Nikulina LD, Tsyrendorzhieva IP, Rakhlin VI, Kosinova ML
Thermochimica Acta, 622, 2, 2015 |
| 2 |
Effect of nitrogen content on phase configuration, nanostructure and mechanical behaviors in magnetron sputtered SiCxNy thin films
Wang JP, Lu YH, Shen YG
Applied Surface Science, 256(6), 1955, 2010 |
| 3 |
Synthesis and characterization of silicon carbonitride films by plasma enhanced chemical vapor deposition (PECVD) using bis(dimethylamino)dimethylsilane (BDMADMS), as membrane for a small molecule gas separation
Kafrouni W, Rouessac V, Julbe A, Durand J
Applied Surface Science, 257(4), 1196, 2010 |
| 4 |
Preparation of silicon carbide nitride thin films by sputtering of silicon nitride target
Peng XF, Song LX, Meng J, Zhang YZ, Hu XF
Applied Surface Science, 173(3-4), 313, 2001 |
| 5 |
Structural analysis and microstructural observation of SiCxNy films prepared by reactive sputtering of SiC in N-2 and Ar
Xiao XC, Li YW, Song LX, Peng XF, Hu XF
Applied Surface Science, 156(1-4), 155, 2000 |
