화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Arsenic-doped Ge-spiked monoemitter SiGe:C heterojunction bipolar transistors by low-temperature trisilane based chemical vapor deposition
You SZ, Decoutere S, Nguyen ND, Van Huylenbroeck S, Sibaja-Hernandez A, Venegas R, Loo R, De Meyer K
Thin Solid Films, 520(8), 3345, 2012
2 SiGe:C HBT transit time analysis based on hydrodynamic modeling using doping, composition and strained dependent SiGe:C carriers mobility and relaxation time
Ramirez-Garcia E, Michaillat M, Aniel F, Zerounian N, Enciso-Aguilar M, Rideau D
Solid-State Electronics, 61(1), 58, 2011
3 Recombination in the Ge-spiked monoemitter of the SiGe:C HBTs
You SZ, Decoutere S, Sibaja-Hernandez A, Venegas R, Van Huylenbroeck S, De Meyer K
Solid-State Electronics, 61(1), 81, 2011
4 Optimization of external poly base sheet resistance in 0.13 mu m quasi self-aligned SiGe:C HBTs
You S, Van Huylenbroeck S, Nguyen ND, Sibaja-Hernandez A, Venegas R, Van Wichelen K, Decoutere S, De Meyer K
Thin Solid Films, 518, S68, 2010
5 Implementation of a scalable VBIC model for SiGe : C HBTs
Chakravorty A, Scholz RF, Knoll D, Fox A, Senapati B, Maiti CK
Solid-State Electronics, 50(3), 399, 2006
6 Impact of lateral and vertical scaling on the reliability of a low-complexity 200 GHz SiGe : C HBT
Piontek A, Choi LJ, Van Huylenbroeck S, Vanhoucke T, Hijzen E, Decoutere S
Thin Solid Films, 508(1-2), 318, 2006
7 Selective epitaxial growth of SiGe : C for high speed HBTs
Schafer H, Bock J, Stengl R, Knapp H, Aufinger K, Wurzer M, Boguth S, Rest M, Schreiter R, Meister TF
Applied Surface Science, 224(1-4), 18, 2004
8 Characterization of Ge gradients in SiGeHBTs by AES depth profile simulation
Kruger D, Penkov A, Yamamoto Y, Goryachko A, Tillack B
Applied Surface Science, 224(1-4), 51, 2004
9 High performance SiGe : C HBTs using atomic layer base doping
Tillack B, Yamamoto Y, Knoll D, Heinemann B, Schley P, Senapati B, Kruger D
Applied Surface Science, 224(1-4), 55, 2004
10 Circuit applications of high-performance SiGe : C HBTs integrated in BiCMOS technology
Winkler W, Borngraber J, Heinemann B, Rucker H, Barth R, Bauer J, Bolze D, Drews J, Ehwald KE, Grabolla T, Haak U, Hoppner W, Knoll D, Kruger D, Kuck B, Kurps R, Marschmeyer M, Richter H, Schley P, Schmidt D, Scholz R, Tillack B, Wolansky D, Wulf HE, Yamamoto Y, Zaumseil P
Applied Surface Science, 224(1-4), 297, 2004