| 1 |
Fast deposition of microcrystalline Si films from SiH2Cl2 using a high-density microwave plasma source for Si thin-film solar cells
Saha JK, Ohse N, Hamada K, Matsui H, Kobayashi T, Jia HJ, Shirai H
Solar Energy Materials and Solar Cells, 94(3), 524, 2010 |
| 2 |
High-density microwave plasma-enhanced chemical vapor deposition of microcrystalline silicon from dichlorosilane
Ohse N, Hamada K, Saha JK, Kobayashi T, Takemura Y, Shirai H
Thin Solid Films, 516(19), 6585, 2008 |
| 3 |
Synthesis of novel p-type nanocrystalline silicon from SiH2Cl2 and SiCl4 by rf plasma-enhanced chemical vapor deposition
Li YL, Ikeda Y, Toyoshima Y, Shirai H
Thin Solid Films, 506, 38, 2006 |
| 4 |
Si thin-film solar cells using. SiH2Cl2 by rf plasma-enhanced chemical vapor deposition
Li YL, Ikeda Y, Saito T, Shirai H
Thin Solid Films, 511, 46, 2006 |
| 5 |
Role of chlorine in the nanocrystalline silicon film formation by rf plasma-enhanced chemical vapor deposition of chlorinated materials
Shirai H
Thin Solid Films, 457(1), 90, 2004 |
| 6 |
Chemistry of the chlorine-terminated surface for low-temperature growth of crystal silicon films by RF plasma-enhanced chemical vapor deposition
Jung SH, Fujimura Y, Ito T, Shirai H
Solar Energy Materials and Solar Cells, 74(1-4), 421, 2002 |
| 7 |
Promising window layer of thin film Si solar cell with p-i-n structure prepared by using SiH2Cl2
Nakashima T, Kondo M, Matsuda A
Solar Energy Materials and Solar Cells, 74(1-4), 429, 2002 |
| 8 |
Formation of nanocrystalline silicon dots from chlorinated materials by RF plasma-enhanced chemical vapor deposition
Shirai H, Fujimura Y, Jung S
Thin Solid Films, 407(1-2), 12, 2002 |
| 9 |
Stability of a-Si : H solar cells deposited by Ar-treatment or by ECR techniques
Ohkawa K, Shimizu S, Sato H, Komaru T, Futako W, Kamiya T, Fortmann CM, Shimizu I
Solar Energy Materials and Solar Cells, 66(1-4), 297, 2001 |
| 10 |
Polycrystalline silicon film deposited by ICP-CVD
Moon BY, Youn JH, Won SH, Jang J
Solar Energy Materials and Solar Cells, 69(2), 139, 2001 |
