화학공학소재연구정보센터
검색결과 : 35건
No. Article
1 First-principles study of defects in amorphous-SiO2/Si interfaces
Li P, Chen ZH, Yao P, Zhang FJ, Wang JW, Song Y, Zuo X
Applied Surface Science, 483, 231, 2019
2 질산산화법을 이용한 SiO2/Si 구조의 계면결함 제거
최재영, 김도연, 김우병
Korean Journal of Materials Research, 28(2), 118, 2018
3 Further indication of a low quartz structure at the SiO2/Si interface from coincidence Doppler broadening spectroscopy
Brauer G, Becvar F, Anwand W, Skorupa W
Applied Surface Science, 252(9), 3368, 2006
4 Arsenic shallow depth profiling: accurate quantification inSiO(2)/Si stack
Barozzi M, Giubertoni D, Anderle M, Bersani A
Applied Surface Science, 231-2, 632, 2004
5 Quality of SiO2 and of SiGe formed by oxidation of Si/Si0.7Ge0.3 heterostructure using atomic oxygen at 400 degrees C
Nohira H, Kuroiwa T, Nakamura A, Hirose Y, Hirose Y, Mitsui J, Sakai W, Nakajima K, Suzuki M, Kimura K, Sawano K, Nakagawa K, Shiraki Y, Hattori T
Applied Surface Science, 237(1-4), 134, 2004
6 Microscopic mechanism of interfacial reaction during Si oxidation
Akiyama T, Kageshima H
Applied Surface Science, 216(1-4), 270, 2003
7 Si/SiO2 interface attack during metal oxide growth under low oxygen pressure
Kubo K, Kiyohara A, Shimoyama K, Yamabe K
Applied Surface Science, 216(1-4), 307, 2003
8 Penetration of electronic states from silicon substrate into silicon oxide
Takahasi K, Seman MB, Hirose K, Hattori T
Applied Surface Science, 190(1-4), 56, 2002
9 Positron characteristics of various SiO2 polymorphs
Kuriplach J, Anwand W, Brauer G, Skorupa W
Applied Surface Science, 194(1-4), 84, 2002
10 Proton trapping and diffusion in SiO2 thin films: a first-principles study
Zhang QM, Tang SP, Wallace RM
Applied Surface Science, 172(1-2), 41, 2001