검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Monocrystalline Quartz ICP Etching: Road to High-Temperature Dry Etching Osipov AA, Iankevich GA, Alexandrov SE Plasma Chemistry and Plasma Processing, 40(1), 423, 2020 |
| 2 |
Improvement in etch selectivity of SiO2 to CVD amorphous carbon mask in dual-frequency capacitively coupled C4F8/CH2F2/O-2/Ar plasmas Kwon BS, Kim JS, Moon HK, Lee NE Thin Solid Films, 518(22), 6451, 2010 |