| 1 |
Flexible foils formed by a prolonged electron beam irradiation in scanning electron microscope
Cechal J, Sikola T
Applied Surface Science, 423, 538, 2017 |
| 2 |
Formation of copper islands on a native SiO2 surface at elevated temperatures
Cechal J, Polcak J, Kolibal M, Babor P, Sikola T
Applied Surface Science, 256(11), 3636, 2010 |
| 3 |
Growth of SiO2 on InP substrate by liquid phase deposition
Lei PH, Yang CD
Applied Surface Science, 256(12), 3757, 2010 |
| 4 |
Improvement in etch selectivity of SiO2 to CVD amorphous carbon mask in dual-frequency capacitively coupled C4F8/CH2F2/O-2/Ar plasmas
Kwon BS, Kim JS, Moon HK, Lee NE
Thin Solid Films, 518(22), 6451, 2010 |
| 5 |
Low-temperature plasma deposition of dielectric coatings from organosilicon precursors
Lin CT, Li F, Mantei TD
Journal of Vacuum Science & Technology A, 17(3), 735, 1999 |
| 6 |
Microscratch test studies of thin silica films on stainless steel substrates
Benayoun S, Fouilland-Paille L, Hantzpergue JJ
Thin Solid Films, 352(1-2), 156, 1999 |
| 7 |
Selective SiO2/Si3N4 etching in magnetized inductively coupled C4F8 plasma
Lee HJ, Kim JK, Kim JH, Whang KW, Kim JH, Joo JH
Journal of Vacuum Science & Technology B, 16(2), 500, 1998 |
| 8 |
Characterization of the Si/SiO2 Interface Formed by Remote Plasma-Enhanced Chemical-Vapor-Deposition from SiH4/N2O with or Without Chlorine Addition
Park YB, Li XD, Rhee SW
Journal of Vacuum Science & Technology B, 14(4), 2660, 1996 |
