| 1 |
High-rate deposition of silicon nitride thin films using plasma-assisted reactive sputter deposition
Takenaka K, Setsuhara Y, Han JG, Uchida G, Ebe A
Thin Solid Films, 685, 306, 2019 |
| 2 |
Moisture barrier and bending properties of silicon nitride films prepared by roll-to-roll plasma enhanced chemical vapor deposition
Cho TY, Lee WJ, Lee SJ, Lee JH, Ryu J, Cho SK, Choa SH
Thin Solid Films, 660, 101, 2018 |
| 3 |
Non-destructive observation of intact bacteria and viruses in water by the highly sensitive frequency transmission electric-field method based on SEM
Ogura T
Biochemical and Biophysical Research Communications, 450(4), 1684, 2014 |
| 4 |
Analysis of ion energy impact on the refractive index of silicon nitride films by use of neural network model
Kim D, Kim B
Current Applied Physics, 12(1), 40, 2012 |
| 5 |
Direct observation of unstained wet biological samples by scanning-electron generation X-ray microscopy
Ogura T
Biochemical and Biophysical Research Communications, 391(1), 198, 2010 |
| 6 |
Radio frequency source power-induced ion energy impact on SiN films deposited by using a pulsed-PECVD in SiH4-N-2 plasma at room temperature
Lee H, Kim B, Kwon S
Current Applied Physics, 10(3), 971, 2010 |
| 7 |
Measurement of the unstained biological sample by a novel scanning electron generation X-ray microscope based on SEM
Ogura T
Biochemical and Biophysical Research Communications, 385(4), 624, 2009 |
| 8 |
Plasma Grooving System Using Atmospheric Pressure Surface Discharge Plasma
Hamada T, Sakoda T, Otsubo M
Plasma Chemistry and Plasma Processing, 29(3), 197, 2009 |
| 9 |
Use of neural network method to characterize pressure controlled charge density of silicon nitride films deposited by PECVD
Kim B, Kim SY
Applied Surface Science, 254(15), 4546, 2008 |
| 10 |
Surface passivation of InGaP/GaAs HBT using silicon-nitride film deposited by ECR-CVD plasma
Manera LT, Zoccal LB, Diniz JA, Tatsch PJ, Doi I
Applied Surface Science, 254(19), 6063, 2008 |
