화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Ferroelectric properties of SOS and SOI pseudo-MOSFETs with HfO2 interlayers
Popov VP, Antonov VA, Ilnitsky MA, Tyschenko IE, Vdovin VI, Miakonkikh AV, Rudenko KV
Solid-State Electronics, 159, 63, 2019
2 Study of high-temperature Smart Cut (TM): Application to silicon-on-sapphire films and to thin foils of single crystal silicon
Meyer R, Kononchuck O, Moriceau H, Lemiti M, Bruel M
Solid-State Electronics, 115, 225, 2016
3 Analysis of the breakdown voltage in SOI and SOS technologies
Roig J, Vellvehi M, Flores D, Rebollo J, Millan J, Krishnan S, De Souza MM, Narayanan EMS
Solid-State Electronics, 46(2), 255, 2002
4 Microscopic observation of strain induced in heteroepitaxial layers with reflection type of infrared polariscope
Yamada M, Chu T
Journal of Crystal Growth, 210(1-3), 102, 2000
5 Adaptation of the pseudo-MOS transistor for the characterization of silicon-on-sapphire films
Hefyene N, Cristoloveanu S, Ghibaudo G, Gentil P, Moriyasu Y, Morishita T, Matsui M, Yasujima A
Solid-State Electronics, 44(10), 1711, 2000
6 Epitaxial and Thermal Strains in Oxidic Thin-Films on Si(001)
Matthee T, Wecker J, Bardal A, Samwer K
Thin Solid Films, 258(1-2), 264, 1995