검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Effect of halogen in high-density oxygen plasmas on photoresist trimming Sin CY, Chen BH, Loh WL, Yu J, Yelehanka P, See A, Chan L AIChE Journal, 50(7), 1578, 2004 |
| 2 |
Characterization of low-k dielectric trench surface cleaning after a fluorocarbon etch Tan YS, Chooi SYM, Sin CY, Ee PY, Srinivasan MP, Pehkonen SO Thin Solid Films, 462-63, 250, 2004 |
| 3 |
Photoresist trimming in oxygen-based high-density plasmas: Effect of HBr and Cl-2 addition to CF4/O-2 mixtures Sin CY, Chen BH, Loh WL, Yu J, Yelehanka P, See A, Chan L Industrial & Engineering Chemistry Research, 42(24), 6080, 2003 |
| 4 |
Resist trimming in high-density CF4/O-2 plasmas for sub-0.1 mu m device fabrication Sin CY, Chen BH, Loh WL, Yu J, Yelehanka P, See A, Chan L Journal of Vacuum Science & Technology B, 20(5), 1974, 2002 |