| 1 |
Thin film atomic layer deposition equipment for semiconductor processing
Sneh O, Clark-Phelps RB, Londergan AR, Winkler J, Seidel TE
Thin Solid Films, 402(1-2), 248, 2002 |
| 2 |
Growth of SiO2 at Room-Temperature with the Use of Catalyzed Sequential Half-Reactions
Klaus JW, Sneh O, George SM
Science, 278(5345), 1934, 1997 |
| 3 |
Thermal-Stability of Hydroxyl-Groups on a Well-Defined Silica Surface
Sneh O, George SM
Journal of Physical Chemistry, 99(13), 4639, 1995 |
| 4 |
Sample Manipulator Employing a Gas-Thermal Switch Designed for High-Pressure Experiments in an Ultrahigh-Vacuum Apparatus
Sneh O, George SM
Journal of Vacuum Science & Technology A, 13(2), 493, 1995 |
| 5 |
H2O Adsorption-Kinetics on Si(111)7X7 and Si(111)7X7 Modified by Laser Annealing
Wise ML, Okada LA, Sneh O, George SM
Journal of Vacuum Science & Technology A, 13(4), 1853, 1995 |
| 6 |
Adsorption and Decomposition of Diethyldiethoxysilane on Silicon Surfaces - New Possibilities for SiO2 Deposition
Wise ML, Sneh O, Okada LA, George SM
Journal of Vacuum Science & Technology B, 13(3), 865, 1995 |
| 7 |
Xenon Diffusion on a Stepped Pt(11,11,9) Surface
Sneh O, George SM
Journal of Chemical Physics, 101(4), 3287, 1994 |
| 8 |
High-Resolution Infrared Overtone Spectroscopy of N-2-HF - Vibrational Red Shifts and Predissociation Rate as a Function of HF Stretching Quanta
Farrell JT, Sneh O, Nesbitt DJ
Journal of Physical Chemistry, 98(24), 6068, 1994 |
