화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Control of etch depth in patterned semiconductor substrates using real time spectroscopic ellipsometry
Cho SJ, Snyder PG, Ianno NJ, Herzinger CM, Johs B
Thin Solid Films, 455-56, 645, 2004
2 Etch depth control in bulk GaAs using patterning and real time spectroscopic ellipsometry
Cho SJ, Snyder PG, Herzinger CM, Johs B
Journal of Vacuum Science & Technology B, 20(1), 197, 2002
3 Spectroscopic analysis of photochromic films
Mo YG, Dillon RO, Snyder PG
Journal of Vacuum Science & Technology A, 17(1), 170, 1999
4 Visible and infrared photochromic properties of amorphous WO3-x films
Mo YG, Dillon RO, Snyder PG
Journal of Vacuum Science & Technology A, 17(5), 2933, 1999
5 Real time monitoring and control of wet etching of GaAs/Al0.3Ga0.7As using real time spectroscopic ellipsometry
Cho SJ, Snyder PG
Journal of Vacuum Science & Technology B, 17(5), 2045, 1999
6 Optical properties of photochromic organic-inorganic composites
Mo YG, Dillon RO, Snyder PG, Tiwald TE
Thin Solid Films, 355-356, 1, 1999
7 Investigation of citric acid hydrogen peroxide etched GaAs and Al0.3Ga0.7As surfaces by spectroscopic ellipsometry
Snyder PG, Cho SJ
Journal of Vacuum Science & Technology B, 16(5), 2680, 1998
8 Infrared free carrier response of In0.15Ga0.85As0.17Sb0.83 epilayers on GaSb
Snyder PG, Tiwald TE, Thompson DW, Ianno NJ, Woollam JA, Mauk MG, Shellenbarger ZA
Thin Solid Films, 313-314, 667, 1998
9 Is Your Plant Inherently Safer
Snyder PG
Hydrocarbon Processing, 75(7), 77, 1996
10 Spectroscopic Ellipsometric Monitoring of Electron-Cyclotron-Resonance Plasma-Etching of GaAs and AlGaAs
Snyder PG, Ianno NJ, Wigert B, Pittal S, Johs B, Woollam JA
Journal of Vacuum Science & Technology B, 13(6), 2255, 1995