검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Optical properties of a multibeam column with a single-electron source Kamimura O, Tanimoto S, Ohta H, Nakayama Y, Sakakibara M, Sohda Y, Muraki M, Gotoh S, Hosoda M, Someda Y, Tamamori K, Hirose F, Nagae K, Kato K, Okunuki M Journal of Vacuum Science & Technology B, 25(1), 140, 2007 |
| 2 |
Inspection of all beams in multielectron beam system Tanimoto S, Sugaya M, Furukawa A, Sohda Y, Hosoda M, Someda Y, Muraki M, Tamamori K, Hirose F, Nagae K, Kato K Journal of Vacuum Science & Technology B, 25(2), 380, 2007 |
| 3 |
Coulomb blur in a multi-electron-beam system Sohda Y, Kamimura O, Ohta H Journal of Vacuum Science & Technology B, 24(6), 2761, 2006 |
| 4 |
Development of an electron-beam lithography system for high accuracy masks Kawano H, Ito H, Mizuno K, Matsuzaka T, Kawasaki K, Saitou N, Ohta H, Sohda Y Journal of Vacuum Science & Technology B, 21(2), 823, 2003 |
| 5 |
Pattern dependent alignment technique for mix-and-match electron-beam lithography with optical lithography Gotoh Y, Sohda Y, Saitou N, Tawa T, Matsuzaka T, Asai N, Hayano K, Hasegawa N Journal of Vacuum Science & Technology B, 16(6), 3202, 1998 |
| 6 |
Fabrication of Arrayed Glassy-Carbon Field Emitters Sohda Y, Tanenbaum DM, Turner SW, Craighead HG Journal of Vacuum Science & Technology B, 15(2), 343, 1997 |
| 7 |
Modified Mask Methods for Pattern Accuracy Enhancement in Electron-Beam Lithography Sohda Y, Someda Y, Nakayama Y, Saitou N Journal of Vacuum Science & Technology B, 14(6), 3850, 1996 |
| 8 |
Coulomb Effect in Cell Projection Lithography Sohda Y, Someda Y, Saitou N, Itoh H Journal of Vacuum Science & Technology B, 13(6), 2419, 1995 |
| 9 |
Electron-Beam Cell Projection Lithography - Its Accuracy and Its Throughput Someda Y, Satoh H, Sohda Y, Nakayama Y, Saitou N, Itoh H, Sasaki M Journal of Vacuum Science & Technology B, 12(6), 3399, 1994 |