| 1 |
Enhancing the oxygen evolution reaction performance of NiFeOOH electrocatalyst for Zn-air battery by N-doping
Li JW, Song JD, Huang BY, Liang GF, Liang WL, Huang GJ, Jin YQ, Zhang H, Xie FY, Chen J, Wang N, Jin YS, Li XB, Meng H
Journal of Catalysis, 389, 375, 2020 |
| 2 |
Dehydrofluorination of 1, 1, 1, 3, 3-pentafluoropropane over C-AlF3 composite catalysts: Improved catalyst stability by the presence of pre-deposited carbon
Fang XX, Wang Y, Jia WZ, Song JD, Wang YJ, Luo MF, Lu JQ
Applied Catalysis A: General, 576, 39, 2019 |
| 3 |
Effects of thermal and electrical stress on defect generation in InAs metal-oxide-semiconductor capacitor
Baik M, Kang HK, Kang YS, Jeong KS, Lee C, Kim H, Song JD, Cho MH
Applied Surface Science, 467, 1161, 2019 |
| 4 |
Effect of Fe promotion on the performance of V2O5/MgF2 catalysts for gas-phase dehydrofluorination of 1,1,1,3,3-pentafluoropropane
Fang XX, Liao WM, Song JD, Jia WZ, Wang Y, Lu JQ, Luo MF
Applied Surface Science, 490, 365, 2019 |
| 5 |
Dehydrochlorination of 1, 1, 2-trichloroethane over SiO2-supported alkali and transition metal catalysts: Tunable selectivity controlled by the acid - base properties of the catalysts
Song TY, Dong ZX, Song JD, Wang XX, Xie GQ, Luo MF, Lu JQ
Applied Catalysis B: Environmental, 236, 368, 2018 |
| 6 |
Optical studies on a single GaAs laterally coupled quantum dot in comparison with an uncoupled quantum dot
Kim H, Song JD
Applied Surface Science, 427, 405, 2018 |
| 7 |
Catalytic dehydrofluorination of 1,1,1,3,3-pentafluoropropane to 1,3,3,3-tetrafluoropropene over fluorinated NiO/Cr2O3 catalysts
Luo JW, Song JD, Jia WZ, Pu ZY, Lu JQ, Luo MF
Applied Surface Science, 433, 904, 2018 |
| 8 |
Temperature dependence of the radiative recombination time in laterally coupled GaAs quantum dots
Kim H, Murayama A, Kim J, Song JD
Applied Surface Science, 457, 497, 2018 |
| 9 |
Zero bias conductance peak in InAs nanowire coupled to superconducting electrodes
Kim NH, Shin YS, Kim HS, Song JD, Doh YJ
Current Applied Physics, 18(4), 384, 2018 |
| 10 |
Engineering of AlON interlayer in Al2O3/AlON/In0.53Ga0.47As gate stacks by thermal atomic layer deposition
Lee WC, Cho CJ, Park SI, Jun DH, Song JD, Hwang CS, Kim SK
Current Applied Physics, 18(8), 919, 2018 |
