화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Heavy ion projection beam system for material modification at high ion energy
Weidenmuller U, Meijer J, Stephan A, Bukow HH, Sossna E, Volland B, Rangelow IW
Journal of Vacuum Science & Technology B, 20(1), 246, 2002
2 Mechanical, geometrical, and electrical characterization of silicon membranes for open stencil masks
Sossna E, Degen A, Rangelow IW, Drzik M, Hudek P, Tiwald TE, Woollam JA
Journal of Vacuum Science & Technology B, 19(6), 2665, 2001
3 Thickness analysis of silicon membranes for stencil masks
Sossna E, Kassing R, Rangelow IW, Herzinger CM, Tiwald TE, Woollam JA, Wagner T
Journal of Vacuum Science & Technology B, 18(6), 3259, 2000
4 Comparison of silicon stencil mask distortion measurements with finite element analysis
Ehrmann A, Struck T, Chalupka A, Haugeneder E, Loschner H, Butschke J, Irmscher M, Letzkus F, Springer R, Degen A, Rangelow IW, Shi F, Sossna E, Volland B, Engelstad R, Lovell E, Tejeda R
Journal of Vacuum Science & Technology B, 17(6), 3107, 1999
5 p-n junction-based wafer flow process for stencil mask fabrication
Rangelow IW, Shi F, Volland B, Sossna E, Petrashenko A, Hudek P, Sunyk R, Butschke J, Letzkus F, Springer R, Ehrmann A, Gross G, Kaesmaier R, Oelmann A, Struck T, Unger G, Chalupka A, Haugeneder E, Lammer G, Loschner H, Tejeda R, Lovell E, Engelstad R
Journal of Vacuum Science & Technology B, 16(6), 3592, 1998