화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Kinetics of TiSi2 Formation and Silicon Consumption During Chemical-Vapor-Deposition
Southwell RP, Seebauer EG
Journal of the Electrochemical Society, 144(6), 2122, 1997
2 A Predictive Kinetic-Model for the Chemical-Vapor-Deposition of TiSi2
Southwell RP, Seebauer EG
Journal of the Electrochemical Society, 143(5), 1726, 1996
3 Optimization of Selective TiSi2 Chemical-Vapor-Deposition by Mechanistic Chemical-Kinetics
Southwell RP, Mendicino MA, Seebauer EG
Journal of Vacuum Science & Technology A, 14(3), 928, 1996
4 Adsorption of TiCl4 on TiSi2 - Application to Silicide Chemical-Vapor-Deposition
Southwell RP, Seebauer EG
Journal of Vacuum Science & Technology A, 13(2), 221, 1995
5 Chemical-Vapor-Deposition of TiSi2 Using SiH4 and TiCl4
Mendicino MA, Southwell RP, Seebauer EG
Thin Solid Films, 253(1-2), 473, 1994