검색결과 : 5건
No. | Article |
---|---|
1 |
Kinetics of TiSi2 Formation and Silicon Consumption During Chemical-Vapor-Deposition Southwell RP, Seebauer EG Journal of the Electrochemical Society, 144(6), 2122, 1997 |
2 |
A Predictive Kinetic-Model for the Chemical-Vapor-Deposition of TiSi2 Southwell RP, Seebauer EG Journal of the Electrochemical Society, 143(5), 1726, 1996 |
3 |
Optimization of Selective TiSi2 Chemical-Vapor-Deposition by Mechanistic Chemical-Kinetics Southwell RP, Mendicino MA, Seebauer EG Journal of Vacuum Science & Technology A, 14(3), 928, 1996 |
4 |
Adsorption of TiCl4 on TiSi2 - Application to Silicide Chemical-Vapor-Deposition Southwell RP, Seebauer EG Journal of Vacuum Science & Technology A, 13(2), 221, 1995 |
5 |
Chemical-Vapor-Deposition of TiSi2 Using SiH4 and TiCl4 Mendicino MA, Southwell RP, Seebauer EG Thin Solid Films, 253(1-2), 473, 1994 |