화학공학소재연구정보센터
검색결과 : 9건
No. Article
1 Directing Neuronal Outgrowth and Network Formation of Rat Cortical Neurons by Cyclic Substrate Stretch
Abraham JA, Linnartz C, Dreissen G, Springer R, Blaschke S, Rueger MA, Fink GR, Hoffmann B, Merkel R
Langmuir, 35(23), 7423, 2019
2 Lipid Domain Specific Recruitment of Lipophilic Nucleic Acids: A Key for Switchable Functionalization of Membranes
Loew M, Springer R, Scolari S, Altenbrunn F, Seitz O, Liebscher J, Huster D, Herrmann A, Arbuzova A
Journal of the American Chemical Society, 132(45), 16066, 2010
3 Thermal emissivity of carbon coated p-doped silicon stencil masks for ion projection lithography
Braun D, Gajic R, Kuchar F, Korntner R, Haugeneder E, Loeschner H, Butschke J, Letzkus F, Springer R
Journal of Vacuum Science & Technology B, 21(1), 123, 2003
4 Comparison of silicon stencil mask distortion measurements with finite element analysis
Ehrmann A, Struck T, Chalupka A, Haugeneder E, Loschner H, Butschke J, Irmscher M, Letzkus F, Springer R, Degen A, Rangelow IW, Shi F, Sossna E, Volland B, Engelstad R, Lovell E, Tejeda R
Journal of Vacuum Science & Technology B, 17(6), 3107, 1999
5 Comparative evaluation of electron-beam sensitive single layer top surface imaging and bilayer chemical amplification of resist lines process for stencil mask making
Elian K, Irmscher M, Butschke J, Letzkus F, Reuter C, Springer R
Journal of Vacuum Science & Technology B, 17(6), 3122, 1999
6 Directly sputtered stress-compensated carbon protective layer for silicon stencil masks
Hudek P, Hrkut P, Drzik M, Kostic I, Belov M, Torres J, Wasson J, Wolfe JC, Degen A, Rangelow IW, Voigt J, Butschke J, Letzkus F, Springer R, Ehrmann A, Kaesmaier R, Kragler K, Mathuni J, Haugeneder E, Loschner H
Journal of Vacuum Science & Technology B, 17(6), 3127, 1999
7 p-n junction-based wafer flow process for stencil mask fabrication
Rangelow IW, Shi F, Volland B, Sossna E, Petrashenko A, Hudek P, Sunyk R, Butschke J, Letzkus F, Springer R, Ehrmann A, Gross G, Kaesmaier R, Oelmann A, Struck T, Unger G, Chalupka A, Haugeneder E, Lammer G, Loschner H, Tejeda R, Lovell E, Engelstad R
Journal of Vacuum Science & Technology B, 16(6), 3592, 1998
8 Top surface imaging process at and below quarter-micron resolution and pattern transfer into metal
Irmscher M, Hofflinger B, Reuter C, Springer R, Stauffer C, Puttock M
Journal of Vacuum Science & Technology B, 15(6), 2605, 1997
9 Comparative-Evaluation of Chemically Amplified Resists for Electron-Beam Top Surface Imaging Use
Irmscher M, Hofflinger B, Springer R
Journal of Vacuum Science & Technology B, 12(6), 3925, 1994