| 1 |
Deposition-rate controlled nitrogen-doping into cuprous oxide and its thermal stability
Ye F, Zeng JJ, Qiu YB, Cai XM, Wang B, Wang H, Zhang DP, Fan P, Roy VAL
Thin Solid Films, 674, 44, 2019 |
| 2 |
Structural and physical properties of tin oxide thin films for optoelectronic applications
Lin SS, Tsai YS, Bai KR
Applied Surface Science, 380, 203, 2016 |
| 3 |
Effect of sputtering pressure on structure and dielectric properties of bismuth magnesium niobate thin films prepared by RF magnetron sputtering
Gao LB, Jiang SW, Li RG
Thin Solid Films, 603, 391, 2016 |
| 4 |
The effect of pressure and W-doping on the properties of ZnO thin films for NO2 gas sensing
Tesfamichael T, Cetin C, Piloto C, Arita M, Bell J
Applied Surface Science, 357, 728, 2015 |
| 5 |
The pressure dependence of the deposition rate in a magnetron sputtering system
Sheikin EG
Thin Solid Films, 574, 52, 2015 |
| 6 |
Determining factor of MoSe2 formation in Cu(In,Ga)Se-2 solar Cells
Zhu XL, Zhou Z, Wang YM, Zhang L, Li AM, Huang FQ
Solar Energy Materials and Solar Cells, 101, 57, 2012 |
| 7 |
Effects of sputtering pressure on the field emission properties of N-doped SrTiO3 thin films coated on Si tip arrays
Bian HJ, Chen XF, Pan JS, Zhu W, Sun CQ
Applied Surface Science, 255(9), 4867, 2009 |
| 8 |
Growth of InN films on (111)GaAs substrates by reactive magnetron sputtering
Guo QX, Murata K, Nishio M, Ogawa H
Applied Surface Science, 169, 340, 2001 |
