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| No. | Article |
|---|---|
| 1 |
Plasma-Enhanced Chemical-Vapor-Deposition of Thick Silicon-Nitride Films with Low-Stress on InP Shi L, Steenbergen CA, Devreede AH, Smit MK, Scholtes TL, Groen FH, Pedersen JW Journal of Vacuum Science & Technology A, 14(2), 471, 1996 |