검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
On-line patterned wafer thickness control of chemical-mechanical polishing Smith TH, Fang SJ, Stefani JA, Shinn GB, Boning DS, Butler SW Journal of Vacuum Science & Technology A, 17(4), 1384, 1999 |
| 2 |
1st-Wafer Effect in Remote Plasma Processing - The Stripping of Photoresist, Silicon-Nitride, and Polysilicon Loewenstein LM, Stefani JA, Butler SW Journal of Vacuum Science & Technology B, 12(4), 2810, 1994 |
| 3 |
Sensor Integration into Plasma Etch Reactors of a Developmental Pilot Line Barna GG, Loewenstein LM, Brankner KJ, Butler SW, Mozumder PK, Stefani JA, Henck SA, Chapados P, Buck D, Maung S, Saxena S, Unruh A Journal of Vacuum Science & Technology B, 12(4), 2860, 1994 |