검색결과 : 14건
| No. | Article |
|---|---|
| 1 |
Nanopatterning of magnetic disks by single-step Ar+ ion projection Dietzel A, Berger R, Loeschner H, Platzgummer E, Stengl G, Bruenger WH, Letzkus F Advanced Materials, 15(14), 1152, 2003 |
| 2 |
Characterization of a process development tool for ion projection lithography Loeschner H, Stengl G, Kaesmaier R, Wolter A Journal of Vacuum Science & Technology B, 19(6), 2520, 2001 |
| 3 |
Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment Volland B, Shi F, Heerlein H, Rangelow IW, Hudek P, Kostic I, Cekan E, Vonach H, Loeschner H, Horner C, Stengl G, Buschbeck H, Zeininger M, Bleeker A, Benschop J Journal of Vacuum Science & Technology B, 18(6), 3202, 2000 |
| 4 |
Experimental evaluation of an optimized radiation cooling geometry for ion projection lithography masks Torres JL, Nounu HN, Wasson JR, Wolfe JC, Lutz J, Haugeneder E, Loschner H, Stengl G, Kaesmaier R Journal of Vacuum Science & Technology B, 18(6), 3207, 2000 |
| 5 |
Ion projection lithography: International development program Kaesmaier R, Loschner H, Stengl G, Wolfe JC, Ruchhoeft P Journal of Vacuum Science & Technology B, 17(6), 3091, 1999 |
| 6 |
Experimental results of the stochastic Coulomb interaction in ion projection lithography de Jager PWH, Derksen G, Mertens B, Cekan E, Lammer G, Vonach H, Buschbeck H, Zeininger M, Horner C, Loschner H, Stengl G, Bleeker AJ, Benschop J, Shi F, Volland B, Hudek P, Heerlein H, Rangelow IW, Kaesmaier R Journal of Vacuum Science & Technology B, 17(6), 3098, 1999 |
| 7 |
Ion projection lithography: Status of the MEDEA project and United States European cooperation Gross G, Kaesmaier R, Loschner H, Stengl G Journal of Vacuum Science & Technology B, 16(6), 3150, 1998 |
| 8 |
Optimization of the temperature distribution across stencil mask membranes under ion beam exposure Kim B, Engelstad R, Lovell E, Chalupka A, Haugeneder E, Lammer G, Loschner H, Lutz J, Stengl G Journal of Vacuum Science & Technology B, 16(6), 3602, 1998 |
| 9 |
Stochastic Coulomb interactions in ion projection lithography systems with aberration-broadened crossover Kruit P, Barth JE, Lammer G, Chalupka A, Vonach H, Loschner H, Stengl G Journal of Vacuum Science & Technology B, 15(6), 2369, 1997 |
| 10 |
Control of Temperature-Gradients and Distortion of Ion Projection Lithography Masks Birman A, Levush B, Melngailis J, Loschner H, Stengl G Journal of Vacuum Science & Technology B, 13(6), 2584, 1995 |