화학공학소재연구정보센터
검색결과 : 7건
No. Article
1 Surface modification of polycarbonate and polyethylene naphtalate foils by UV-ozone treatment and mu Plasma printing
Verkuijlen ROF, van Dongen MHA, Stevens AAE, van Geldrop J, Bernards JPC
Applied Surface Science, 290, 381, 2014
2 Roughening during XeF2 etching of Si(100) through interface layers: H:Si(100) and a-Si/Si(100)
Stevens AAE, van de Sanden MCM, Beijerinck HCW, Kessels WMM
Journal of Vacuum Science & Technology A, 27(2), 367, 2009
3 Molecular dynamics simulations of Ar+ bombardment of Si with comparison to experiment
Humbird D, Graves DB, Stevens AAE, Kessels WMM
Journal of Vacuum Science & Technology A, 25(6), 1529, 2007
4 Surface roughness in XeF2 etching of a-Si/c-Si(100) (vol 23, pg 126, 2005)
Stevens AAE, Beijerinck HCW
Journal of Vacuum Science & Technology A, 24(4), 1151, 2006
5 Amorphous silicon layer characteristics during 70-2000 eV Ar+-ion bombardment of Si(100)
Stevens AAE, Kessels WMM, van de Sanden MCM, Beijerinck HCW
Journal of Vacuum Science & Technology A, 24(5), 1933, 2006
6 Surface roughness in XeF2 etching of a-Si/c-Si(100)
Stevens AAE, Beijerinck HCW
Journal of Vacuum Science & Technology A, 23(1), 126, 2005
7 Time-resolved cavity ring-down spectroscopic study of the gas phase and surface loss rates of Si and SiH3 plasma radicals
Hoefnagels JPM, Stevens AAE, Boogaarts MGH, Kessels WMM, van de Sanden MCM
Chemical Physics Letters, 360(1-2), 189, 2002