검색결과 : 12건
| No. | Article |
|---|---|
| 1 |
Evolution of electron projection optics from variable axis immersion lenses to projection reduction exposure with variable axis immersion lenses Stickel W, Pfeiffer HC, Golladay SD, Gordon MS Journal of Vacuum Science & Technology B, 20(6), 2627, 2002 |
| 2 |
PREVAIL-EPL alpha tool: Early results Golladay SD, Pfeiffer HC, Bohnenkamp CA, Dhaliwal RS, Enichen WA, Gordon MS, Kendall RA, Lieberman JE, Stickel W, Rockrohr JD, Tressler EV, Tanimoto A, Yamaguchi T, Okamoto K, Suzuki K, Miura T, Okino T, Kawata S, Morita K, Suzuki SC, Shimizu H, Kojima S, Varnell G, Novak WT, Sogard M Journal of Vacuum Science & Technology B, 19(6), 2459, 2001 |
| 3 |
Electron optical image correction subsystem in electron beam projection lithography Kojima S, Stickel W, Rockrohr JD, Gordon M Journal of Vacuum Science & Technology B, 18(6), 3017, 2000 |
| 4 |
Application of the generalized curvilinear variable axis lens to electron projection Stickel W, Langner GO Journal of Vacuum Science & Technology B, 18(6), 3029, 2000 |
| 5 |
PREVAIL Alpha system: Status and design considerations Golladay SD, Pfeiffer HC, Rockrohr JD, Stickel W Journal of Vacuum Science & Technology B, 18(6), 3072, 2000 |
| 6 |
PREVAIL: Dynamic correction of aberrations Gordon MS, Enichen WA, Golladay SD, Pfeiffer HC, Robinson CF, Stickel W Journal of Vacuum Science & Technology B, 18(6), 3079, 2000 |
| 7 |
Projection reduction exposure with variable axis immersion lenses: Next generation lithography Pfeiffer HC, Dhaliwal RS, Golladay SD, Doran SK, Gordon MS, Groves TR, Kendall RA, Lieberman JE, Petric PF, Pinckney DJ, Quickle RJ, Robinson CF, Rockrohr JD, Senesi JJ, Stickel W, Tressler EV, Tanimoto A, Yamaguchi T, Okamoto K, Suzuki K, Okino T, Kawata S, Morita K, Suziki SC, Shimizu H, Kojima S, Varnell G, Novak WT, Stumbo DP, Sogard M Journal of Vacuum Science & Technology B, 17(6), 2840, 1999 |
| 8 |
PREVAIL: Theory of the proof of concept column electron optics Stickel W, Langner GO Journal of Vacuum Science & Technology B, 17(6), 2847, 1999 |
| 9 |
PREVAIL: Operation of the electron optics proof-of-concept system Gordon MS, Lieberman JE, Petric PF, Robinson CF, Stickel W Journal of Vacuum Science & Technology B, 17(6), 2851, 1999 |
| 10 |
Simulation of Coulomb interactions in electron beam lithography systems - A comparison of theoretical models Stickel W Journal of Vacuum Science & Technology B, 16(6), 3211, 1998 |