| 1 |
Investigation of wall chemical effect using PLIF measurement of OH radical generated by pulsed electric discharge
Fan Y, Lin WR, Wan S, Suzuki Y
Combustion and Flame, 196, 255, 2018 |
| 2 |
Multiscale modeling and experimental analysis of chemical vapor deposited aluminum films: Linking reactor operating conditions with roughness evolution
Aviziotis IG, Cheimarios N, Duguet T, Vahlas C, Boudouvis AG
Chemical Engineering Science, 155, 449, 2016 |
| 3 |
Limitations of patterning thin films by shadow mask high vacuum chemical vapor deposition
Reinke M, Kuzminykh Y, Hoffmann P
Thin Solid Films, 563, 56, 2014 |
| 4 |
Platinum nanocluster growth on vertically aligned carbon nanofiber arrays: Sputtering experiments and molecular dynamics simulations
Brault P, Caillard A, Charles C, Boswell RW, Graves DB
Applied Surface Science, 263, 352, 2012 |
| 5 |
Temperature dependence of the sticking coefficient in atomic layer deposition
Rose M, Bartha JW, Endler I
Applied Surface Science, 256(12), 3778, 2010 |
| 6 |
Preparation and calibration of ultrathin Zn layers on Pd(111)
Kratzer M, Tamtogl A, Killmann J, Schennach R, Winkler A
Applied Surface Science, 255(11), 5755, 2009 |
| 7 |
Method to determine the sticking coefficient of precursor molecules in atomic layer deposition
Rose M, Bartha JW
Applied Surface Science, 255(13-14), 6620, 2009 |
| 8 |
Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering: The method and results
Leroy WP, Mahieu S, Persoons R, Depla D
Thin Solid Films, 518(5), 1527, 2009 |
| 9 |
Sticking coefficient of nitrogen on solid N-2 at low temperatures
Deng SHM, Cassidy DB, Greaves RG, Mills AP
Applied Surface Science, 253(24), 9467, 2007 |
| 10 |
Assessment of kinetic modeling procedures of TAP experiments
Schuurman Y
Catalysis Today, 121(3-4), 187, 2007 |
