검색결과 : 2건
No. | Article |
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1 |
Cryogenic etch process development for profile control of high aspect-ratio submicron silicon trenches Pruessner MW, Rabinovich WS, Stievater TH, Park D, Baldwin JW Journal of Vacuum Science & Technology B, 25(1), 21, 2007 |
2 |
Characterization of hydrogen silsesquioxane as a Cl-2/BCl3 inductively coupled plasma etch mask for air-clad InP-based quantum well waveguide fabrication Park D, Stievater TH, Rabinovich WS, Green N, Kanakaraju S, Calhoun LC Journal of Vacuum Science & Technology B, 24(6), 3152, 2006 |