화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Cryogenic etch process development for profile control of high aspect-ratio submicron silicon trenches
Pruessner MW, Rabinovich WS, Stievater TH, Park D, Baldwin JW
Journal of Vacuum Science & Technology B, 25(1), 21, 2007
2 Characterization of hydrogen silsesquioxane as a Cl-2/BCl3 inductively coupled plasma etch mask for air-clad InP-based quantum well waveguide fabrication
Park D, Stievater TH, Rabinovich WS, Green N, Kanakaraju S, Calhoun LC
Journal of Vacuum Science & Technology B, 24(6), 3152, 2006