검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
0.18 mu m KrF lithography using optical proximity correction based on empirical behavior modeling Tritchkov A, Stirniman J, Gangala H, Ronse K Journal of Vacuum Science & Technology B, 16(6), 3398, 1998 |
| No. | Article |
|---|---|
| 1 |
0.18 mu m KrF lithography using optical proximity correction based on empirical behavior modeling Tritchkov A, Stirniman J, Gangala H, Ronse K Journal of Vacuum Science & Technology B, 16(6), 3398, 1998 |