검색결과 : 11건
No. | Article |
---|---|
1 |
Near-surface generation of negative ions in low-pressure discharges Stoffels E, Stoffels WW, Kroutilina VM, Wagner HE, Meichsner J Journal of Vacuum Science & Technology A, 19(5), 2109, 2001 |
2 |
Laser-induced particle formation and coalescence in a methane discharge Stoffels WW, Stoffels E, Ceccone G, Rossi F Journal of Vacuum Science & Technology A, 17(6), 3385, 1999 |
3 |
Polymerization of fluorocarbons in reactive ion etching plasmas Stoffels WW, Stoffels E, Tachibana K Journal of Vacuum Science & Technology A, 16(1), 87, 1998 |
4 |
Silicon Surfaces Treated by CF4, CF4/H-2, and CF4/O-2 RF Plasmas - Study by in-Situ Fourier-Transform Infrared Ellipsometry Shirafuji T, Stoffels WW, Moriguchi H, Tachibana K Journal of Vacuum Science & Technology A, 15(2), 209, 1997 |
5 |
Measurement of the Gas Temperature in Fluorocarbon Radio-Frequency Discharges Using Infrared-Absorption Spectroscopy Haverlag M, Stoffels E, Stoffels WW, Kroesen GM, Dehoog FJ Journal of Vacuum Science & Technology A, 14(2), 380, 1996 |
6 |
Production and Destruction of Cfx Radicals in Radiofrequency Fluorocarbon Plasmas Haverlag M, Stoffels WW, Stoffels E, Kroesen GM, Dehoog FJ Journal of Vacuum Science & Technology A, 14(2), 384, 1996 |
7 |
Dust Formation and Charging in an Ar/SiH4 Radiofrequency Discharge Stoffels E, Stoffels WW, Kroesen GM, Dehoog FJ Journal of Vacuum Science & Technology A, 14(2), 556, 1996 |
8 |
Detection of Dust Particles in the Plasma by Laser-Induced Heating Stoffels WW, Stoffels E, Kroesen GM, Dehoog FJ Journal of Vacuum Science & Technology A, 14(2), 588, 1996 |
9 |
Negative-Ions in a Ccl2F2 Radio-Frequency Discharge Stoffels E, Stoffels WW, Vender D, Kroesen GM, Dehoog FJ Journal of Vacuum Science & Technology A, 13(4), 2051, 1995 |
10 |
The Chemistry of a Ccl2F2 Radio-Frequency Discharge Stoffels WW, Stoffels E, Haverlag M, Kroesen GM, Dehoog FJ Journal of Vacuum Science & Technology A, 13(4), 2058, 1995 |