화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Near-surface generation of negative ions in low-pressure discharges
Stoffels E, Stoffels WW, Kroutilina VM, Wagner HE, Meichsner J
Journal of Vacuum Science & Technology A, 19(5), 2109, 2001
2 Laser-induced particle formation and coalescence in a methane discharge
Stoffels WW, Stoffels E, Ceccone G, Rossi F
Journal of Vacuum Science & Technology A, 17(6), 3385, 1999
3 Polymerization of fluorocarbons in reactive ion etching plasmas
Stoffels WW, Stoffels E, Tachibana K
Journal of Vacuum Science & Technology A, 16(1), 87, 1998
4 Silicon Surfaces Treated by CF4, CF4/H-2, and CF4/O-2 RF Plasmas - Study by in-Situ Fourier-Transform Infrared Ellipsometry
Shirafuji T, Stoffels WW, Moriguchi H, Tachibana K
Journal of Vacuum Science & Technology A, 15(2), 209, 1997
5 Measurement of the Gas Temperature in Fluorocarbon Radio-Frequency Discharges Using Infrared-Absorption Spectroscopy
Haverlag M, Stoffels E, Stoffels WW, Kroesen GM, Dehoog FJ
Journal of Vacuum Science & Technology A, 14(2), 380, 1996
6 Production and Destruction of Cfx Radicals in Radiofrequency Fluorocarbon Plasmas
Haverlag M, Stoffels WW, Stoffels E, Kroesen GM, Dehoog FJ
Journal of Vacuum Science & Technology A, 14(2), 384, 1996
7 Dust Formation and Charging in an Ar/SiH4 Radiofrequency Discharge
Stoffels E, Stoffels WW, Kroesen GM, Dehoog FJ
Journal of Vacuum Science & Technology A, 14(2), 556, 1996
8 Detection of Dust Particles in the Plasma by Laser-Induced Heating
Stoffels WW, Stoffels E, Kroesen GM, Dehoog FJ
Journal of Vacuum Science & Technology A, 14(2), 588, 1996
9 Negative-Ions in a Ccl2F2 Radio-Frequency Discharge
Stoffels E, Stoffels WW, Vender D, Kroesen GM, Dehoog FJ
Journal of Vacuum Science & Technology A, 13(4), 2051, 1995
10 The Chemistry of a Ccl2F2 Radio-Frequency Discharge
Stoffels WW, Stoffels E, Haverlag M, Kroesen GM, Dehoog FJ
Journal of Vacuum Science & Technology A, 13(4), 2058, 1995