검색결과 : 1건
No. | Article |
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1 |
Depth profiling of ultrashallow B implants in silicon using a magnetic-sector secondary ion mass spectrometry instrument Napolitani E, Carnera A, Storti R, Privitera V, Priolo F, Mannino G, Moffatt S Journal of Vacuum Science & Technology B, 18(1), 519, 2000 |