화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Comparison of silicon stencil mask distortion measurements with finite element analysis
Ehrmann A, Struck T, Chalupka A, Haugeneder E, Loschner H, Butschke J, Irmscher M, Letzkus F, Springer R, Degen A, Rangelow IW, Shi F, Sossna E, Volland B, Engelstad R, Lovell E, Tejeda R
Journal of Vacuum Science & Technology B, 17(6), 3107, 1999
2 p-n junction-based wafer flow process for stencil mask fabrication
Rangelow IW, Shi F, Volland B, Sossna E, Petrashenko A, Hudek P, Sunyk R, Butschke J, Letzkus F, Springer R, Ehrmann A, Gross G, Kaesmaier R, Oelmann A, Struck T, Unger G, Chalupka A, Haugeneder E, Lammer G, Loschner H, Tejeda R, Lovell E, Engelstad R
Journal of Vacuum Science & Technology B, 16(6), 3592, 1998