검색결과 : 2건
No. | Article |
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1 |
Comparison of silicon stencil mask distortion measurements with finite element analysis Ehrmann A, Struck T, Chalupka A, Haugeneder E, Loschner H, Butschke J, Irmscher M, Letzkus F, Springer R, Degen A, Rangelow IW, Shi F, Sossna E, Volland B, Engelstad R, Lovell E, Tejeda R Journal of Vacuum Science & Technology B, 17(6), 3107, 1999 |
2 |
p-n junction-based wafer flow process for stencil mask fabrication Rangelow IW, Shi F, Volland B, Sossna E, Petrashenko A, Hudek P, Sunyk R, Butschke J, Letzkus F, Springer R, Ehrmann A, Gross G, Kaesmaier R, Oelmann A, Struck T, Unger G, Chalupka A, Haugeneder E, Lammer G, Loschner H, Tejeda R, Lovell E, Engelstad R Journal of Vacuum Science & Technology B, 16(6), 3592, 1998 |