검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
First lithographic results from the extreme ultraviolet Engineering Test Stand Chapman HN, Ray-Chaudhuri AK, Tichenor DA, Replogle WC, Stulen RH, Kubiak GD, Rockett PD, Klebanoff LE, O'Connell D, Leung AH, Jefferson KL, Wronosky JB, Taylor JS, Hale LC, Blaedel K, Spiller EA, Sommargren GE, Folta JA, Sweeney DW, Gullikson EM, Naulleau P, Goldberg KA, Bokor J, Attwood DT, Mickan U, Hanzen R, Panning E, Yan PY, Gwyn CW, Lee SH Journal of Vacuum Science & Technology B, 19(6), 2389, 2001 |
| 2 |
Direct Aerial Image Measurements to Evaluate the Performance of an Extreme-Ultraviolet Projection Lithography System Fields CH, Oldham WG, Raychaudhuri AK, Krenz KD, Stulen RH Journal of Vacuum Science & Technology B, 14(6), 4000, 1996 |
| 3 |
Fabrication of Metal-Oxide-Semiconductor Devices with Extreme-Ultraviolet Lithography Nguyen KB, Cardinale GF, Tichenor DA, Kubiak GD, Berger K, Raychaudhuri AK, Perras Y, Haney SJ, Nissen R, Krenz K, Stulen RH, Fujioka H, Hu C, Bokor J, Tennant DM, Fetter LA Journal of Vacuum Science & Technology B, 14(6), 4188, 1996 |
| 4 |
Printability of Substrate and Absorber Defects on Extreme-Ultraviolet Lithographic Masks Nguyen KB, Raychaudhuri AK, Stulen RH, Krenz K, Fetter LA, Tennant DM, Windt DL Journal of Vacuum Science & Technology B, 13(6), 3082, 1995 |
| 5 |
Characterization of an Expanded-Field Schwarzschild Objective for Extreme-Ultraviolet Lithography Kubiak GD, Tichenor DA, Raychaudhuri AK, Malinowski ME, Stulen RH, Haney SJ, Berger KW, Nissen RP, Wilkerson GA, Paul PH, Bjorkholm JE, Fetter LA, Freeman RR, Himel MD, Macdowell AA, Tennant DM, Wood OR, Waskiewicz WK, White DL, Windt DL, Jewell TE Journal of Vacuum Science & Technology B, 12(6), 3820, 1994 |