검색결과 : 9건
| No. | Article |
|---|---|
| 1 |
Improvement of resolution in x-ray lithography by reducing secondary electron blur Kise K, Watanabe H, Itoga K, Sumitani H, Amemiya M Journal of Vacuum Science & Technology B, 22(1), 126, 2004 |
| 2 |
Fabrication of high resolution x-ray masks using diamond membrane for second generation x-ray lithography Marumoto K, Yabe H, Aya S, Kise K, Ami S, Sasaki K, Watanabe H, Itoga K, Sumitani H Journal of Vacuum Science & Technology B, 21(1), 207, 2003 |
| 3 |
Extreme expansion of proximity gap by double exposures using enlarged pattern masks for line and space pattern formation in x-ray lithography (evolution of exposure method to symmetric illumination) Toyota E, Washio M, Watanabe H, Sumitani H Journal of Vacuum Science & Technology B, 21(6), 2821, 2003 |
| 4 |
Suppression of secondary electron blur by using Br-containing resists in x-ray lithography Kise K, Marumoto K, Watanabe H, Itoga K, Kumada T, Sumitani H, Kitayama T, Amemiya M, Watanabe Y, Uda K Journal of Vacuum Science & Technology B, 20(6), 2953, 2002 |
| 5 |
Recent progress in 1X x-ray mask technology: Feasibility study using ASET-NIST format TaXN x-ray masks with 100 nm rule 4 Gbit dynamic random access memory test patterns Tsuboi S, Tanaka Y, Iwamoto T, Sumitani H, Nakayama Y Journal of Vacuum Science & Technology B, 19(6), 2416, 2001 |
| 6 |
Effect of secondary electron from the substrate in x-ray lithography using harder radiation spectra Itoga K, Marumoto K, Kitayama T, Sumitani H, Amemiya M, Watanabe Y Journal of Vacuum Science & Technology B, 19(6), 2439, 2001 |
| 7 |
Evaluation of new x-ray stepper, the XRA Sumitani H, Suita M, Mitsui S, Aoyama H, Fujii K, Watanabe H, Taguchi T, Matsui Y Journal of Vacuum Science & Technology B, 19(6), 2448, 2001 |
| 8 |
Evaluation of exposure dose repeatability in synchrotron radiation lithography Itoga K, Sumitani H, Watanabe H, Kumada T, Kodera I, Satoh S, Ogushi N, Oishi S, Edo R, Yamamoto T, Watanabe Y Journal of Vacuum Science & Technology B, 18(2), 774, 2000 |
| 9 |
Overlay Accuracy of Canon Synchrotron-Radiation Stepper Xfpa for 0.15-Mu-M Process Saitoh K, Ohsawa H, Sentoku K, Matsumoto T, Mizusawa N, Fukuda Y, Uda K, Sumitani H, Hifumi T Journal of Vacuum Science & Technology B, 14(6), 4303, 1996 |