화학공학소재연구정보센터
검색결과 : 13건
No. Article
1 An in-depth study of thermal effects in reset transitions in HfO2 based RRAMs
Villena MA, Gonzalez MB, Roldan JB, Campabadal F, Jimenez-Molinos F, Gomez-Campos FM, Sune J
Solid-State Electronics, 111, 47, 2015
2 Three-state resistive switching in HfO2-based RRAM
Lian XJ, Miranda E, Long SB, Perniola L, Liu M, Sune J
Solid-State Electronics, 98, 38, 2014
3 Effect of an ultrathin SiO2 interfacial layer on the hysteretic current-voltage characteristics of CeOx-based metal-insulator-metal structures
Miranda E, Kano S, Dou C, Sune J, Kakushima K, Iwai H
Thin Solid Films, 533, 38, 2013
4 Explicit model for the gate tunneling current in double-gate MOSFETs
Chaves F, Jimenez D, Sune J
Solid-State Electronics, 68, 93, 2012
5 Modeling the breakdown statistics of Al2O3/HfO2 nanolaminates grown by atomic-layer-deposition
Conde A, Martinez C, Jimenez D, Miranda E, Rafi JM, Campabadal F, Sune J
Solid-State Electronics, 71, 48, 2012
6 Explicit model for direct tunneling current in double-gate MOSFETs through a dielectric stack
Chaves F, Jimenez D, Sune J
Solid-State Electronics, 76, 19, 2012
7 Degradation and breakdown characteristics of Al/HfYOx/GaAs capacitors
Miranda E, Mahata C, Das T, Sune J, Maiti CK
Thin Solid Films, 520(7), 2956, 2012
8 Explicit quantum potential and charge model for double-gate MOSFETs
Chaves F, Jimenez D, Sune J
Solid-State Electronics, 54(5), 530, 2010
9 Interplay of voltage and temperature acceleration of oxide breakdown for ultra-thin gate oxides
Wu E, Sune J, Lai W, Nowak E, McKenna J, Vayshenker A, Harmon D
Solid-State Electronics, 46(11), 1787, 2002
10 Quantitative two-step hydrogen model of SiO2 gate oxide breakdown
Sune J, Wu E
Solid-State Electronics, 46(11), 1825, 2002