화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 ArF resist-friendly etching technology
Hayashi T, Morikawa Y, Suu K, Ishikawa M
Journal of Vacuum Science & Technology B, 26(5), 1775, 2008
2 A novel deep etching technology for Si and quartz materials
Morikawa Y, Koidesawa T, Hayashi T, Suu K
Thin Solid Films, 515(12), 4918, 2007
3 Development of PZT sputtering method for mass-production
Masuda T, Miyaguchi Y, Tanimura M, Nishioka Y, Suu K, Tani N
Applied Surface Science, 169, 539, 2001