검색결과 : 13건
| No. | Article |
|---|---|
| 1 |
Fabrication of high-aspect ratio silicon nanopillars and nanocones using deep reactive ion etching Fischer C, Menezes JW, Moshkalev SA, Verissimo C, Vaz AR, Swart JW Journal of Vacuum Science & Technology B, 27(6), 2732, 2009 |
| 2 |
Platinum thin films deposited on silicon oxide by focused ion beam: characterization and application Vaz AR, da Silva MM, Leon J, Moshkalev SA, Swart JW Journal of Materials Science, 43(10), 3429, 2008 |
| 3 |
Structural and surface properties of Si1-xGex thin films obtained by reduced pressure CVD Teixeira RC, Doi I, Diniz JA, Swart JW, Zakia MBP Applied Surface Science, 254(1), 207, 2007 |
| 4 |
Fabrication and characterization of Ge nanocrystalline growth by ion implantation in SiO2 matrix Mestanza SNM, Doi I, Swart JW, Frateschi NC Journal of Materials Science, 42(18), 7757, 2007 |
| 5 |
Characterization and modeling of antireflective coatings of SiO2, Si3N4, and SiOxNy deposited by electron cyclotron resonance enhanced plasma chemical vapor deposition Mestanza SNM, Obrador MP, Rodriguez E, Biasotto C, Doi I, Diniz JA, Swart JW Journal of Vacuum Science & Technology B, 24(2), 823, 2006 |
| 6 |
Efficacy of ECR-CVD silicon nitride passivation in InGaP/GaAs HBTs Zoccal LB, Diniz JA, Doi I, Swart JW, Daltrini AM, Moshkalyov SA Journal of Vacuum Science & Technology B, 24(4), 1762, 2006 |
| 7 |
X-ray multiple diffraction on the shallow junction of B in Si(001) Orloski RV, Pudenzi MAA, Hayashi MA, Swart JW, Cardoso LP Journal of Molecular Catalysis A-Chemical, 228(1-2), 177, 2005 |
| 8 |
Mechanisms of silicon nitride etching by electron cyclotron resonance plasmas using SF6- and NF3-based gas mixtures Reyes-Betanzo C, Moshkalyov SA, Ramos ACS, Swart JW Journal of Vacuum Science & Technology A, 22(4), 1513, 2004 |
| 9 |
Silicon nitride deposited by ECR-CVD at room temperature for LOCOS isolation technology Pereira MA, Diniz JA, Doi I, Swart JW Applied Surface Science, 212, 388, 2003 |
| 10 |
Silicon nitride etching in high- and low-density plasmas using SF6/O-2/N-2 mixtures Reyes-Betanzo C, Mohshkalyov SA, Swart JW, Ramos ACS Journal of Vacuum Science & Technology A, 21(2), 461, 2003 |