검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Practical approach for modeling extreme ultraviolet lithography mask defects Gullikson EM, Cerjan C, Stearns DG, Mirkarimi PB, Sweeney DW Journal of Vacuum Science & Technology B, 20(1), 81, 2002 |
| 2 |
First lithographic results from the extreme ultraviolet Engineering Test Stand Chapman HN, Ray-Chaudhuri AK, Tichenor DA, Replogle WC, Stulen RH, Kubiak GD, Rockett PD, Klebanoff LE, O'Connell D, Leung AH, Jefferson KL, Wronosky JB, Taylor JS, Hale LC, Blaedel K, Spiller EA, Sommargren GE, Folta JA, Sweeney DW, Gullikson EM, Naulleau P, Goldberg KA, Bokor J, Attwood DT, Mickan U, Hanzen R, Panning E, Yan PY, Gwyn CW, Lee SH Journal of Vacuum Science & Technology B, 19(6), 2389, 2001 |
| 3 |
Method for compensation of extreme-ultraviolet multilayer defects Ray-Chaudhuri AK, Cardinale G, Fisher A, Yan PY, Sweeney DW Journal of Vacuum Science & Technology B, 17(6), 3024, 1999 |
| 4 |
Generation of subquarter-micron resist structures using optical interference lithography and image reversal Decker JY, Fernandez A, Sweeney DW Journal of Vacuum Science & Technology B, 15(6), 1949, 1997 |
| 5 |
Methods for fabricating arrays of holes using interference lithography Fernandez A, Decker JY, Herman SM, Phillion DW, Sweeney DW, Perry MD Journal of Vacuum Science & Technology B, 15(6), 2439, 1997 |