검색결과 : 19건
| No. | Article |
|---|---|
| 1 |
PINK1 Loss-of-Function Mutations Affect Mitochondrial Complex I Activity via NdufA10 Ubiquinone Uncoupling Morais VA, Haddad D, Craessaerts K, De Bock PJ, Swerts J, Vilain S, Aerts L, Overbergh L, Grunewald A, Seibler P, Klein C, Gevaert K, Verstreken P, De Strooper B Science, 344(6180), 203, 2014 |
| 2 |
Direct Copper Electrochemical Deposition on Ru-Based Substrates for Advanced Interconnects Target 30 nm and 1/2 Pitch Lines: From Coupon to Full-Wafer Experiments Armini S, El-Mekki Z, Swerts J, Nagar M, Demuynck S Journal of the Electrochemical Society, 160(3), D89, 2013 |
| 3 |
Ozone Based Atomic Layer Deposition of Hafnium Oxide and Impact of Nitrogen Oxide Species Delabie A, Swerts J, Van Elshocht S, Jung SH, Raisanen PI, Givens ME, Shero EJ, Peeters J, Machkaoutsan V, Maes JW Journal of the Electrochemical Society, 158(5), D259, 2011 |
| 4 |
Lanthanide Aluminates as Dielectrics for Non-Volatile Memory Applications: Material Aspects Adelmann C, Swerts J, Richard O, Conard T, Popovici M, Meersschaut J, Afanas'ev VV, Breuil L, Cacciato A, Opsomer K, Brijs B, Tielens H, Pourtois G, Bender H, Jurczak M, Van Houdt J, Van Elshocht S, Kittl JA Journal of the Electrochemical Society, 158(8), H778, 2011 |
| 5 |
Rare-earth aluminates as a charge trapping materials for NAND flash memories: Integration and electrical evaluation Suhane A, Cacciato A, Richard O, Arreghini A, Adelmann C, Swerts J, Rothschild O, Van den Bosch G, Breuil L, Bender H, Jurczak M, Debusschere I, Kittl JA, De Meyer K, Van Houdt J Solid-State Electronics, 65-66, 177, 2011 |
| 6 |
Ozone-Based Metal Oxide Atomic Layer Deposition: Impact of N-2/O-2 Supply Ratio in Ozone Generation Delabie A, Caymax M, Gielis S, Maes JW, Nyns L, Popovici M, Swerts J, Tielens H, Peeters J, Van Elshocht S Electrochemical and Solid State Letters, 13(6), II176, 2010 |
| 7 |
Atomic Layer Deposition of Strontium Titanate Films Using Sr((Bu3Cp)-Bu-t)(2) and Ti(OMe)(4) Popovici M, Van Elshocht S, Menou N, Swerts J, Pierreux D, Delabie A, Brijs B, Conard T, Opsomer K, Maes JW, Wouters DJ, Kittl JA Journal of the Electrochemical Society, 157(1), G1, 2010 |
| 8 |
Impact of Precursor Chemistry and Process Conditions on the Scalability of ALD HfO2 Gate Dielectrics Swerts J, Peys N, Nyns L, Delabie A, Franquet A, Maes JW, Van Elshocht S, De Gendt S Journal of the Electrochemical Society, 157(1), G26, 2010 |
| 9 |
Atomic Layer Deposition of Gd-Doped HfO2 Thin Films Adelmann C, Tielens H, Dewulf D, Hardy A, Pierreux D, Swerts J, Rosseel E, Shi X, Van Bael MK, Kittl JA, Van Elshocht S Journal of the Electrochemical Society, 157(4), G105, 2010 |
| 10 |
ALD and Parasitic Growth Characteristics of the Tetrakisethylmethylamino Hafnium (TEMAH)/H2O Process Nyns L, Delabie A, Swerts J, Van Elshocht S, De Gendt S Journal of the Electrochemical Society, 157(11), G225, 2010 |